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Electronic and Acoustic Engineering
ISSN 2524-2725 · e‑ISSN 2617-0965 Open Access · CC BY-NC 4.0
Vol. 2 · Issue 1 · 2019 Feb 28, 2019 Microsystems and Physical Electronics

The influence of the passive layer on the electric field distribution in ferroelectric thin films

HS
Hanna Shevliakova Corresponding National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute” shevliakova.hv@gmail.com Ukraine
AM
Anna Morozovska National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute” Ukraine
GS
Georgii Sviechnikov National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute” Ukraine
Pages6-10 PublishedFeb 28, 2019 LicenseOpen Access
EAE 1 VOL 2 · 1
VOL 2 · NO 1 · 2019 View issue

Abstract

The influence of the passive layer on the electric field distribution in ferroelectric thin films is analyzed analytically. The study was carried out for ferroelectric thin films with a nonuniform spontaneous polarization distribution along the polar direction. During the study it was assumed that on the ferroelectric film surfaces there are passive layers of fixed thickness, in which there is no spontaneous polarization. This corresponds to an overwhelming majority of experiments. The dielectric susceptibility of these films differs from the susceptibility of ferroelectric film. The analytical dependence of the electric potential distribution in ferroelectric thin films on the passive layer thickness is derived. Calculations were made for dielectric and semiconductor passive layers. Also, the case of the presence of a surface charge at the interface of the ferroelectric film - a passive layer was considered. It is shown that all considered cases have the same kind of the dependence of the electric potential distribution on the passive layer thickness. 

Keywords

References

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