Skip to content
Microsystems, Electronics and Acoustics
ISSN 2523-4447 · e‑ISSN 2523-4455 Open Access · CC BY-SA 4.0
Vol. 22 · Issue 6 · 2017 Dec 29, 2017 Vacuum, plasma and quantum electronics

Microwave plasma generation using evanescent waves

VP
Volodymyr Volodymyrovych Perevertailo Corresponding National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute” Ukraine
AK
Anatoly Ivanovitch Kuzmichev National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute” Ukraine
Pages12-17 PublishedDec 29, 2017
VOL 22 · ISS 6 · 2017 View issue

Abstract

Analysis and comparison of possible design features of microwave low-temperature plasma generators, which are based on evanesсent waves, was carried out in this paper. Three approaches which provide excitation of evanescent wave are discussed: excitation based on below cutoff waveguide; evanescent wave which is excited by surface waves; evanescent wave which is excited near the surface of the dielectric based on effect of violation of total internal reflection. These three methods make it possible to get the evanescent wave for generation of gas-discharge plasma. Equipment and technology based on these methods are not fully studied yet and required analysis and improvements. The results of this study could be applied in new designs and processes in the field of treatment of the surface layer of solids. The results of the first experiments using such generators are presented in this paper and prospects of further applications for ion-plasma treatment of the surface layer of solids (deleting, printing material and surface modification) are determined. The issue of microwave plasma generation and other technological processes based on evanescent waves is extremely important. The cause of that is their concern of various branches of science and technology including plasmonics, nanoelectronics, optics and they are widely discussed in recent years. By analogy with the effects in optics, evanescent waves can cause similar effects in gas-discharge technology. “Evanescent waves” – separate direction in electrodynamics associated with the study of these waves: their properties and possibilities of their application. Now this trend is taking on widespread development, especially in nanophotonics (excitation of plasmon oscillations and waves of plasmon polariton type). In this paper, the possibility of using the evanecent mode of the microwave waves for excitation of plasma formation is considered.Also in the paper was devoted the attention to prototyping of microwave generators that will provide the technological requirements for the surface treatment of solids and deposited coatings, giving competitive results, thus are environmentally safe, easy-to-work and relatively inexpensive design on the market. On the basis of the research, propositions of the future developing in this direction are put forward. The aim of the study is providing homogeneity zone of the surface under treatment of solid body with surface area of up to square meters, which could be used in flat-panel displays, presentation screens, solar panels, etc. Ref. 13, fig. 6.

Keywords

References

  1. B. Danilin, Primenenie nizkotemperaturnoi plazmy dlia naneseniia tonkih plenok [Low-temperature plasma application for thin film deposition], Moscow: Energoatomizdat, 1989, p. 328. ISBN 5-283-03939-0
  2. B. Danilin; V.Kireev, Primenenie nizkotemperaturnoi plazmy dlia travlenia i ochistki materialov [Low-temperature plasma application for etching and cleaning of materials], Moscow: Energoatomizdat, 1987, p. 264.
  3. N. G. Einspruch; D. M. Brown, Plasma processing for VLSI, Orlando: Academic Press, 1984, p. 469.
  4. Y. N. Korkishko, Vvedenie v protsessy integralnykh mikro- i nanotehnologyi. Tom 2: Tehnologicheskie aspekty [Introduction to processes of integral micro- and nanotechnology. Vol. 2. Technological aspects], vol. 2, Moscow: BINOM. Laboratory of knowledge, 2011, p. 252. ISBN 5-9963-0336-6
  5. O. Volpian; A. Kuzmichev; V. Perevertailo, «Bezelektrodnyi activator reaktsionnogo gaza dlia opticheskoi tonkoplenochnoi technologii. [Electrodeless activator of reactive gas for optical thin-film technology],» Nanoingeneria, no. 9, pp. 11-16, 2014.
  6. O. Volpian; A. Kuzmichev, Otritsatelnoe prelomlenie voln. Vvedenie v fiziku I technologiu elektromagnitnyh metamaterialov [Negative refraction of waves. Introduction to the physics and technology of electromagnetic metamaterials], Kyiv: Avers, 2012, p. 360.
  7. O. Volpian; A. Kuzmichev, «Nanorazmernye elektronno-fotonnye ustroistva na osnove poverhnostnyh plazmonnyh poliaritonov. [Nanoscale electron-photon devices based on surface plasmon polaritons],» Electronics and Communications, vol. 16, no. 1, pp. 5-11, 2011.
  8. I. Lebedev, Tehnika i pribory SVCh. Tom 1 [Microwave technique and devices. Vol. 1], Moskow: Vyshaya shkola, 1970, p. 440.
  9. E. F. Abdel; M. Suzuki; Y. Kitamura; H. Shindo, "Large-scaled line plasma production by evanescent microwave in a narrow rectangular waveguide," in 28th International Conference on Phenomena in Ionized Gases, ICPIG'2007 , Prague, Czech Republic, 2007.
  10. E. F. Abdel; S. Fuji; H. Shindo, "Large-scaled line plasma production by evanescent microwave," Plasma Devices and Operations, vol. 17, no. 3, p. 221–228, 2009. DOI: 10.1080/10519990902958029
  11. G. Shanmugavelayutham; R. Ramasamy; T. Fukasawa; H. Kajiyama; T. Shinoda, "Development of uniform line-shaped plasma under long wavelength evanescent microwave (LWEM) for PDP processing," in The 9th Asian Symposium on Information Display, ASID'2006 , New Delhi, India, 2006.
  12. Y. Yoshida; H. Ogura, "Compact holey-plate plasma source," Vacuum, vol. 74, no. 3-4, pp. 509-513, June 2004. DOI: 10.1016/j.vacuum.2004.01.022
  13. Emanuel Stockman; James Michael; Alex Fuller; Sohail Zaidi; Richard Miles, "Toward high Q, evanescent coupled microwave controlled combustion," in 47th AIAA Aerospace Sciences Meeting Including The New Horizons Forum and Aerospace Exposition , Orlando, Florida, USA, 2009. DOI: 10.2514/6.2009-491
§ 06 — Related

Similar articles in this journal

Related peer-reviewed studies published in this journal.
View all issues

Quasistatic Identification of The Shading Structure of Solar Panels by The Method of Cardinal Number Vectors

PhD, Assoc. Prof. Olena Olehivna Abakumova, Dr.Sc.(Eng.), Prof. Valerii Yakovych Zhuikov, Mykola O. Lukianov

In the article the problem of identification the shading structure of solar panels is considered. The relevance of the study is conditioned by the necessity of rapid and…

#solar panels #photovoltaic surface #shadow structure modeling #quasistatic identification
p. 362283.1-362283.7
10.20535/2523-4455.mea.362283

Most read articles by the same author(s)

Similar Articles

1-10 of 33

You may also start an advanced similarity search for this article.